Area Selective Deposition

Submission Deadline: August 24, 2022Contribute to this Special Topic

The Journal of Vacuum Science and Technology A is soliciting research articles for a Special Topic Collection on Area Selective Deposition (ASD). This Collection will feature recent discoveries in fundamentals of ASD as well as advances in its technological applications.

Topics covered include, but are not limited to:

  • mechanisms of thin film nucleation and growth
  • controllable activation and/or suppression of nucleation
  • selective patterning using organic layers or resists
  • defect formation and mitigation
  • combinations of deposition with selective etching
  • surface characterization with emphasis on defects
  • metrology for area-selective deposition
  • all applications of ASD

Editors

Eray Aydil, Ney York University

Erwin Kessels, Eindhoven University of Technology

Guest Editors

John Ekerdt, University of Texas at Austin

Rong Chen, Huazhong University of Science and Technology

Manuscript Details & Submission

Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection “Area Selective Deposition”.
Submission Deadline: August 24, 2022Contribute to this Special Topic