JVSTA is devoted to publishing reports of original research, letters, and review articles on interfaces and surfaces of materials, thin films, and plasmas.
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles…
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles…
Vacuum science and technology underpin a vast range of modern scientific and industrial developments, from advanced thin‐film coatings and surface engineering to plasma processing and nanoscale device fabrication. Continuous advances…
This Special Collection honors the iconic career of Professor Gary Rubloff and his lasting impact on semiconductor science, surface chemistry, and thin-film materials. Throughout his career, Prof. Rubloff has pioneered…
Plasma-based techniques remain at the forefront of materials science, providing unique non-equilibrium environments that enable the synthesis and modification of materials with atomic-scale precision. As the demand for next-generation electronic,…
This collection contains papers presented at the 24th International Conference on Molecular Beam Epitaxy (July 12-16, 2026 in Ann Arbor, Michigan; Chairs: Pallab Bhattacharya and Zetian Mi, University of Michigan)…
This Special Topic Collection features articles on gallium oxide including fundamental research on the material as well as its applications in devices. Topics covered include but are not limited to…
This special topic collection includes papers presented during the AVS 72nd International Symposium & Exhibition (November 8-13, 2026 in Pittsburgh, PA). The AVS Symposium is the premier venue for presenting…