Study of Atomic Layer Deposition Materials by XPS and Spectroscopic Ellipsometry

Over the past 20 years, ALD has become a key materials synthesis technique, both for advancing our understanding of the fundamentals of materials synthesis and for enabling applications such as microelectronics, energy storage, photovoltaics, separation technologies, and more. This collection contains experimental datasets of ALD materials, focused on X-ray photoelectron spectroscopy and spectroscopic ellipsometry. As the number of ALD processes and the range of applications grow, access to high-quality experimental data on existing ALD processes is crucial to sustain progress in the field. In addition to providing much-needed reference data for key ALD processes, a collection focused on ALD will help advance our fundamental understanding and accelerate the development of new methods in ways that are not possible through traditional publication formats. These advances include addressing issues such as reproducibility, benchmarking of new ALD processes, uncovering new trends in precursor–surface interactions, and developing new methods to analyze surface science data tailored to complex ALD materials, such as laminates and doped materials with strong compositional heterogeneity.

Manuscript Details & Submission
Authors must use the SSS templates available here. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic Collection on “Study of Atomic Layer Deposition Materials by XPS and Spectroscopic Ellipsometry.”

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Topics covered include, but are not limited to:

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Guest Editors

Angel Yanguas-Gil, Argonne National Laboratory