Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)

Submission Deadline: December 4, 2023
Surface Science Spectra (SSS) welcomes data submissions related to Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) for publication in a Special Topic Collection planned in collaboration with the annual 23rd International Conference on Atomic Layer Deposition (ALD 2023) and the 10th International Atomic Layer Etching Workshop, taking place July 23-26, 2023, in Bellevue, Washington. This collection will include data presented during the annual meeting and workshop as well as other ALD and ALE data that was not presented at the conference but is submitted to the collection.

Topics covered include, but are not limited to:

  • Atomic Layer Deposition (ALD)
  • Thin films
  • Atomic Layer Etching (ALE)
  • Plasma processing
  • Semiconductor device fabrication
  • Chemisorption Physisorption
  • Adsorption
  • Materials treatment
  • Spectroscopy

Submission instructions

Submissions must be submitted on the appropriate technique-specific template. For returning authors, please note that all SSS templates have recently been updated. Please be sure to use the version of the appropriate template that is currently posted online.

Please submit through the online submission system. Online, you will have the opportunity to indicate that your submission is part of this Special Topic Collection by choosing “Atomic Layer Deposition ALD) and Atomic Layer Etching (ALE) ”.

Submission Deadline: December 4, 2023