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  • Journal of Vacuum Science & Technology B
  • Plasma Processing for Advanced Microelectronics

Plasma Processing for Advanced Microelectronics

Submission Deadline: November 30, 2021View Collection

Plasma processing is a critical tool for the microelectronics industry, whose products and systems enable technologies across a wide range of economic sectors, with plasmas used in 40-45% of the fabrication steps in leading microchip manufacturing. Such utilization requires a thorough understanding of the plasma environment and plasma-surface interactions. That requisite understanding will only accelerate as device materials continue to expand beyond Silicon and architectures evolve and can benefit from a robust sharing of information across all applications that utilize plasma-based processing. In response, the Journal of Vacuum Science & Technology B is soliciting research articles for publication in a Special Topic Collection on Plasma Processing for Advanced Microelectronics. The Special Topic Collection will feature articles dedicated to the science and technology of plasma processing associated with enhanced material and device performance, the development of novel materials and device architectures, as well as process control and development in semiconductor, memory and novel or advanced electronic device fabrication.


Topics covered include, but are not limited to:

  • Advanced BEOL and FEOL plasma processing
  • Advanced plasma processing for logic devices, EUV and multi-patterning
  • Advanced packaging, thermal management, and heterogeneous integration
  • Plasma processing for advanced and emerging memory technologies
  • Plasma processing for neuromorphic and quantum computing applications
  • Plasma processing for power electronics
  • Plasma processing for RF and THz devices
  • Plasma-assisted atomic layer etching and deposition in device applications
  • Plasma-based processes and protocols for damage prevention and mitigation
  • Machine learning in plasma process development, monitoring, modeling, and control
  • Precursor and plasma chemistry development for plasma processing
  • Advanced electronics and components for plasma generation and process control
  • Plasma modeling of plasma processes, plasma-surface interactions, and processing tools
  • Plasma based systems that help or enable manufacturing processes

Guest Editors

Sebastian Engelmann, IBM

Keren Kanarik, Lam Research Corporation

Scott Walton, Naval Research Laboratory

Submission Deadline: November 30, 2021View Collection
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