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  • Journal of Vacuum Science & Technology A
  • Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials

Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials

Submission Deadline: July 10, 2024

This Special Topic Collection honors the important contributions of Professor John Ekerdt in both research and leadership in the area of surface and reaction chemistry of electronic and optoelectronic materials. The collection focuses on important challenges, new developments, and current understanding of various topics that John Ekerdt influenced and contributed to.

Topics covered include, but are not limited to:

  • CVD/ALD of Thin Films
  • Nucleation in Film and Nanoparticle Growth
  • Area-selective Deposition
  • Crystalline Thin Films
  • Atomic Layer Etching
  • Thin Film Growth Chemistry

Guest Editors

Stacey F. Bent, Stanford University

Jane P. Chang, University of California Los Angeles


Manuscript Details & Submission

Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection “Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials”.
Submission Deadline: July 10, 2024
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