Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)

Submission Deadline: November 1, 2025Contribute to this Special Topic

The Journal of Vacuum Science & Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE).

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. These ALD and ALE Special Topic Collections will include papers presented at ALD 2025 and ALE 2025, taking place June 22-25, 2025, in Jeju Island, South Korea, as well as other ALD and ALE research articles that were not presented at the conference but are submitted to the collections. The collections feature articles dedicated to the science and technology of atomic layer controlled deposition and etching.

Topics covered include, but are not limited to:

  • Atomic Layer Deposition (ALD)
  • Thin films
  • Atomic Layer Etching (ALE)
  • Plasma processing
  • Semiconductor device fabrication
  • Chemisorption
  • Physisorption
  • Adsorption
  • Materials treatment
  • Spectroscopy

Manuscript Details & Submission

Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection “Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)”.
Submission Deadline: November 1, 2025Contribute to this Special Topic