Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)
The Journal of Vacuum Science & Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE). These special topic collections are planned in collaboration with the annual ALD meeting and ALE Workshop.
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. These ALD and ALE Special Topic Collections will include papers presented at ALD 2023 and ALE 2023, taking place July 23-26, 2023 in Bellevue, Washington, as well as other ALD and ALE research articles that were not presented at the conference but are submitted to the collections. The collections feature articles dedicated to the science and technology of atomic layer controlled deposition and etching.
As data availability becomes more important and challenges to reproducibility and replication of data continue, consider submitting your data to Surface Science Spectra (SSS) simultaneously with your research article submission. SSS welcomes data submissions related to ALD and ALE for publication in a Special Topic Collection on the topics.
Topics covered include, but are not limited to:
- Atomic Layer Deposition (ALD)
- Thin films
- Atomic Layer Etching (ALE)
- Plasma processing
- Semiconductor device fabrication
- Materials treatment
Manuscript Details & Submission