Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)

Submission Deadline: November 15, 2021View Collection

The Journal of Vacuum Science and Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition and Atomic Layer Etching. Each year, the Journal of Vacuum Science and Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. The Collections feature articles dedicated to the science and technology of atomic layer controlled deposition and etching.

Topics covered include, but are not limited to:

  • Atomic Layer Deposition (ALD)
  • Thin films
  • Atomic Layer Etching (ALE)
  • Plasma processing
  • Semiconductor device fabrication
  • Chemisorption
  • Physisorption
  • Adsorption
  • Materials treatment
  • Spectroscopy
Submission Deadline: November 15, 2021View Collection