Area Selective Deposition
Submission Deadline: September 9, 2024Contribute to this Special Topic
![](https://publishing.aip.org/wp-content/uploads/2024/02/ASD_CFP_Fig-1-300x300.jpg)
This collection features recent discoveries in fundamentals of Area Selective Deposition (ASD) as well as advances in its technological applications.
Topics covered include, but are not limited to:
- mechanisms of thin film nucleation and growth
- controllable activation and/or suppression of nucleation
- small molecule inhibition
- bottom-up ASD patterning
- defect formation and mitigation
- combinations of deposition with selective etching
- surface characterization with emphasis on defects
- metrology for area-selective deposition
- all applications of ASD
Editors
Eray Aydil, New York University
Erwin Kessels, Eindhoven University of Technology
Guest Editors
Seán Barry, Carleton University
Paul Ragogna, Western University
Manuscript Details & Submission
Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection “Area Selective Deposition”.
Submission Deadline: September 9, 2024Contribute to this Special Topic