Area Selective Deposition

Submission Deadline: July 7, 2025Contribute to this Special Topic
“Image Credit: Courtesy of Yuxiao Lan and Rong Chen. Background image from https://pixabay.com/illustrations/processor-cpu-computer-chip-2217771/“

This collection features recent discoveries in fundamentals of Area Selective Deposition (ASD) as well as advances in its technological applications.

Topics covered include, but are not limited to:

  • mechanisms of thin film nucleation and growth
  • controllable activation and/or suppression of nucleation
  • small molecule inhibition
  • bottom-up ASD patterning
  • defect formation and mitigation
  • combinations of deposition with selective etching
  • surface characterization with emphasis on defects
  • metrology for area-selective deposition
  • all applications of ASD

Editors

Eray Aydil, New York University

Erwin Kessels, Eindhoven University of Technology

Guest Editors

Seán Barry, Carleton University

Paul Ragogna, Western University

Ralf Tonner-Zech, Universität Leipzig

Anjana Devi, IFW and TU Dresden

Tania Sandoval, Universidad Técnica Federico Santa María

Manuscript Details & Submission

Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection “Area Selective Deposition”.
Submission Deadline: July 7, 2025Contribute to this Special Topic