Area Selective Deposition

Submission Deadline: August 24, 2026Contribute to this Special Topic

Decorative ImageThis collection features recent discoveries in fundamentals of Area Selective Deposition (ASD) as well as advances in its technological applications. It includes papers presented at the 2026 Area Selective Deposition Workshop (March 29 – April 1, 2026, Albany, New York).

Topics covered include, but are not limited to:

  • Mechanisms of thin film nucleation and growth
  • Controllable activation and/or suppression of nucleation
  • Small molecule inhibition
  • Bottom-up ASD patterning
  • Defect formation and mitigation
  • Combinations of deposition with selective etching
  • Surface characterization with emphasis on defects
  • Metrology for area-selective deposition
  • All applications of ASD

Guest Editors

Christophe Vallée, University at Albany

Kandabara Tapily, TEL Technology Center, America

Manuscript Details & Submission

Authors are encouraged to use the JVST article template. Submission information can be found here. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection on “Area Selective Deposition.”

Submission Deadline: August 24, 2026Contribute to this Special Topic