Plasma Sources for Advanced Semiconductor Applications
Plasma sources are essential tools for advanced semiconductor and computation technologies. Laser-produced plasma powers state-of-the-art nanolithography by generating the required extreme-ultraviolet (EUV) light. Remarkable reduction of feature-sizes in modern semiconductors is a major theme for semiconductor manufacturing where features are approaching nanometers and often involve 3D structures. Predicting, modeling, and high-resolution measurements of plasma properties of advanced plasma sources are at the forefront of research for many advanced industrial applications.
This Joint Special Topic Collection in Applied Physics Letters and Physics of Plasmas welcomes new submissions reporting new research results and perspectives in the field of plasma sources and their many important applications to semiconductor and computational technologies.
Authors are welcome to submit letter manuscripts to Applied Physics Letters and longer, regular articles to Physics of Plasmas. The Editorial Policies for these journals, including publication standards and review procedures, can be found here: Applied Physics Letters Editorial Policies and Physics of Plasmas Editorial Policies.
Perspective papers are welcome at either journal. Additional instructions may be found on the Physics of Plasmas Author Instructions page.
Topics covered include, but are not limited to:
- Production and effects of extreme ultraviolet (EUV) light in discharge and laser-produced environment for nanolithography
- New development in plasma sources for semiconductor processing for atomic layer etching (ALE) and atomic layer deposition (ALD)
- Novel plasma and surface diagnostics for processing plasma
- Advanced control methods of plasma sources for semiconductor processing including machine learning algorithm
- Validated predictive modeling of plasma source operation
- Innovative manufacturing for quantum technology applications
- Plasma processes for 2D materials fabrication
Guest Editors
Oscar Versolato, ARCNL/Vrije Universiteit Amsterdam, The Netherlands
Ronnie Hoekstra, ARCNL/Rijksuniversiteit Groningen, The Netherlands
John Sheil, ARCNL/Vrije Universiteit Amsterdam, The Netherlands
Igor Kaganovich, Princeton Plasma Physics Laboratory, USA
Thorsten Lill, Lam Research, USA
Kallol Bera, Applied Materials Inc., USA
Sang Ki Nam, Samsung Electronics, South Korea
Hyo-Chang Lee, Korea Aerospace University, South Korea
Submission Instructions
Manuscripts considered for publication in Physics of Plasmas are expected to meet the respective journal’s standard of acceptance: to report on original and timely results that significantly advance understanding in observational, computational, and theoretical plasma physics. Manuscripts will publish in an issue immediately after acceptance and form a collection with papers from Applied Physics Letters for this Special Topic. For more information on the journal’s editorial policies: https://aip.scitation.org/php/info/policies
Manuscripts must be submitted through the Physics of Plasmas online submission system (PXP). Please select the Special Topic “Plasma Sources for Advanced Semiconductor Applications” to submit your manuscript for consideration in this Special Topic.