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  • Advances in Spectroscopic Ellipsometry Methods and Materials Characterization

Advances in Spectroscopic Ellipsometry Methods and Materials Characterization

Submission Deadline: November 30, 2025Contribute to this Special Topic

The Special Topic seeks manuscript submissions covering a broad range of aspects in the field of ellipsometry and polarimetry, as well as related applications utilizing the polarization properties of light as a diagnostic of surfaces, interfaces, thin films, nanostructures, and bulk materials. We seek manuscripts which report on newest advances in theory, instrumentation, and applications of spectroscopic ellipsometry and polarimetry across physics, chemistry, material science, and life sciences, as well as engineering and metrology.

Topics covered include, but are not limited to:

  • Machine Learning/Artificial Intelligence
  • Advanced Instrumentation and Modeling
  • In-situ and real-time process control in thin film deposition techniques, specifically ALD, PLD, CVD etc.
  • Wideband gap and Ultrawideband gap semiconductors
  • Anisotropic materials
  • Organic materials and organic electronics
  • Semiconductor hetero- and device structures
  • Imaging instrumentation, approaches, and applications
  • Pump-probe fs/ps time-resolved ellipsometry
  • Terahertz instrumentations and applications
  • Industrial applications
  • Low-dimensional and topological materials
  • Extended ultraviolet instrumentation and applications
  • Biological materials and life science applications

Guest Editor

Mathias Schubert, University of Nebraska-Lincoln, USA and Lund University, Sweden

David E. Aspnes, North Carolina State University, USA

Alain Diebold, SUNY Albany, USA

Ufuk Kilic, University of Nebraska-Lincoln

Submission Deadline: November 30, 2025Contribute to this Special Topic
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