Advances in Spectroscopic Ellipsometry Methods and Materials Characterization
Submission Deadline: November 30, 2025Contribute to this Special Topic
The Special Topic seeks manuscript submissions covering a broad range of aspects in the field of ellipsometry and polarimetry, as well as related applications utilizing the polarization properties of light as a diagnostic of surfaces, interfaces, thin films, nanostructures, and bulk materials. We seek manuscripts which report on newest advances in theory, instrumentation, and applications of spectroscopic ellipsometry and polarimetry across physics, chemistry, material science, and life sciences, as well as engineering and metrology.
Topics covered include, but are not limited to:
- Machine Learning/Artificial Intelligence
- Advanced Instrumentation and Modeling
- In-situ and real-time process control in thin film deposition techniques, specifically ALD, PLD, CVD etc.
- Wideband gap and Ultrawideband gap semiconductors
- Anisotropic materials
- Organic materials and organic electronics
- Semiconductor hetero- and device structures
- Imaging instrumentation, approaches, and applications
- Pump-probe fs/ps time-resolved ellipsometry
- Terahertz instrumentations and applications
- Industrial applications
- Low-dimensional and topological materials
- Extended ultraviolet instrumentation and applications
- Biological materials and life science applications
Guest Editor
Mathias Schubert, University of Nebraska-Lincoln, USA and Lund University, Sweden
David E. Aspnes, North Carolina State University, USA
Alain Diebold, SUNY Albany, USA
Ufuk Kilic, University of Nebraska-Lincoln
Submission Deadline: November 30, 2025Contribute to this Special Topic