Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE)
The Journal of Vacuum Science & Technology A is soliciting research articles for publication in Special Topic Collections on Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE).
Each year, in concert with the annual AVS International Conference on Atomic Layer Deposition and International Atomic Layer Etching Workshop, the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALD and ALE. The collections will include papers presented at the conference and workshop held on June 26-29, 2022 in Ghent, Belgium, as well as other ALD and ALE research articles that were not presented at the conference but are submitted to the collection. The collection will feature articles dedicated to the science and technology of atomic layer controlled deposition and etching.
Topics covered include, but are not limited to:
- Atomic Layer Deposition (ALD)
- Thin films
- Atomic Layer Etching (ALE)
- Plasma processing
- Semiconductor device fabrication
- Materials treatment
Manuscript Details & Submission
Authors are encouraged to use the JVST article template. During submission, you will have an opportunity to indicate that your paper is a part of this collection by choosing the Special Topic or Conference Collection on “Atomic Layer Deposition (ALD)” or “Atomic Layer Etching (ALE).”