Area Selective Deposition

Submission Deadline: September 21, 2020

The Journal of Vacuum Science and Technology A is soliciting research articles for a Special Topic Collection on Area Selective Deposition (ASD). This Collection will feature recent discoveries in fundamentals of (ASD) as well as advances in its technological applications.

Topics covered include, but are not limited to:

  • mechanisms of thin film nucleation and growth
  • controllable activation and/or suppression of nucleation
  • selective patterning using organic layers or resists
  • defect formation and mitigation
  • combinations of deposition with selective etching
  • surface characterization with emphasis on defects
  • metrology for area-selective deposition
  • all applications of ASD

Editors

Eray Aydil, New York University

Erwin Kessels, Eindhoven University of Technology

Guest Editors

Adrie Mackus, Eindhoven University of Technology

Tania Sandoval, Universidad Técnica Federico Santa Maria

Submission Deadline: September 21, 2020